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Plasma System – Ares Batch Plasma System

Ares is a standalone batch plasma cleaning system, designed for large surface substrates or matrix trays.

Features
Plasma System – Ares Batch Plasma System
Description
  • With maximum uniformity, superior gas and RF distribution, a proprietary controlling software and compliance to CE and SEMI international standards, our plasma cleaning and etching systems are ideal for all applications where process reliability and repeatability are a must.

Categories: Electrical & Electronics, Plasma Cleaning & Etching System, Production Equipment, SCI Plasma, Semiconductor

ARES – Large Surface Batch Plasma System

Ares is a standalone batch plasma cleaning system, designed for large surface substrates or matrix trays.

Ares’ chamber is specially designed to handle high power conditions required when performing etching processes.

Product Features:

The features contained in this system allow reliable and repeatable cycling of the plasma process for 24/7 operation.

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